Information and Communications
Semiconductors
Lithography Materials
Photoresists & Multilayer Materials
The lithography process is a core technology that determines the scaling and performance of semiconductor devices. JSR offers a comprehensive portfolio that includes photoresists from i-line to EUV, as well as a variety of organic and inorganic multilayer materials. By offering a comprehensive portfolio and advancing material designs that simultaneously enable high device performance and high reliability, we continuously support our customers’ process innovation fromcutting-edge nodes to legacy ones.
Photoresists & Multilayer Materials
The lithography process is a core technology that determines the scaling and performance of semiconductor devices. JSR offers a comprehensive portfolio that includes photoresists from i-line to EUV, as well as a variety of organic and inorganic multilayer materials. By offering a comprehensive portfolio and advancing material designs that simultaneously enable high device performance and high reliability, we continuously support our customers’ process innovation fromcutting-edge nodes to legacy ones.
Process Materials
CMP Materials (Slurries/Cleaning Solutions)
CMP slurries and post-CMP cleaning solutions are essential to high-performance LSI manufacturing. JSR’s materials offer high planarization performance and selectivity, achieving defect reduction and high reproducibility to meet device scaling demands.
Cleaning Solutions
Functional cleaning solutions efficiently remove fine particles, metal ions, and reaction byproducts remaining on substrate surfaces before and after SAM treatment following etching.
Advanced Packaging Materials
Thick Layer Plating Photoresists
JSR’s thick layer plating photoresists offer excellent resolution, resistance to various plating solutions, and robustness for vacuum processes, and can be used for flip-chip bump formation, micro-bump formation, and redistribution layer (RDL) formation of semiconductor packages. With a single spin-coating, the negative-tone resist achieves a film thickness of 100 µm.
Photo-Imageable Dielectric Materials
JSR’s materials are suitable for the redistribution layers and photo-imageable dielectrics used in WL-CSP (wafer-level chip-size packages) and SiP (system-in-package), as well as for organic passivation materials for semiconductor devices. We also offer PFAS-free products in response to growing societal concerns in recent years.
In addition, as a photo-imageable insulating film for redistribution layers targeted at packages that integrate resin and metal wiring, such as fan-out packages, we are developing a low-temperature-curable polyimide that can use alkaline developers, enabling lower process cost and reduced environmental impact.
ALD/CVD Materials
Precursors for ALD/CVD
Based on advanced molecular design, synthesis technology, and quality control systems, we enable atomic-layer-level film thickness control, achieving excellent film quality, uniformity, and step coverage. Our materials’ high purity, low metal contamination, and stable supply support a wide range of applications, including gate dielectrics, barrier metal, and wiring formation for advanced semiconductors.
Dopants
JSR provides high-purity dopant materials for controlling the electrical properties of semiconductor devices. We achieve high purity and precise concentration control, enabling uniform doping.
Displays
LCD Materials
Alignment Layer
This material controls the uniaxial alignment and tilt angle of liquid crystal molecules, enabling high-resolution and high-contrast displays. It is used in various LCD modes, including VA, PSA, UV2A, TN, IPS, FFS, and O-IPS.
Passivation coat
It is a high-transmittance, high-passivation coat formed on TFT substrates. It supports contact-hole patterning and contributes to larger pixel apertures and lower power consumption.
Over Coat
Applied on the CF substrate side, it contributes to long-term LCD reliability and high image quality by providing surface planarization, preventing external contamination, and delivering high heat resistance and adhesion.
OLED Materials
Low-temperature passivation coating
Functioning as a protective layer for OLED panels, its low-temperature curability minimizes thermal damage to the device while delivering high reliability and flexibility. It is also suitable for next-generation mobile OLEDs, including curved, foldable, and rollable designs.
Organic inter layer passivation coat
It delivers high resolution, high reliability, and low dielectric constant, making it ideal for the stacked designs in IT devices and mobile OLEDs. It also supports bending and low-temperature processes, enabling diverse architectures for next-generation devices.
Light Extraction Material
Materials that enhance light extraction efficiency, enabling high-refractive-index designs and lens-shape control. They are also used in AR/VR and automotive applications, contributing to higher brightness and lower energy consumption.
Thin film encapsulation
It features a low dielectric constant and a PFAS-free design. Its high barrier properties and flexibility enable longer OLED panel lifespans, lower energy consumption, and bend resistance. It also offers excellent mass producibility.
Bank and defining layer
These materials define pixel boundaries and provide planarization of stacked layers. They deliver high light-blocking performance, excellent surface smoothness, and a low dielectric constant, helping prevent color mixing and improving display quality. They are used in a wide range of OLED panel applications, including TVs, smartphones, IT devices, automotive displays, and AR/VR.
Next Generation Display Materials
Thick Film Materials for Micro-LEDs
It enables high-precision film-thickness control while offering low residual stress, strong adhesion, and high transparency.
As a next-generation material, it contributes to higher brightness, improved reliability, and excellent mass producibility in micro-LED displays.
Heat Resistant Transparent Resins
Heat-Resistant Transparent Resin ARTON®
ARTON® is JSR’s proprietary transparent cycloolefin polymer resin, featuring superior optical properties, heat resistance, and dimensional stability. It is used primarily for retardation-films in LCD/OLED displays to achieve high image quality, and serves as a suitable heat-resistant transparent resin for a wide range of optical applications.
Optical Lens
Heat Resistant Transparent Resins
Heat-Resistant Transparent Resin ARTON®
ARTON® is JSR’s proprietary transparent cycloolefin polymer resin, featuring superior optical properties, heat resistance, and dimensional stability. It is used primarily for retardation-films in LCD/OLED displays to achieve high image quality, and serves as a suitable heat-resistant transparent resin for a wide range of optical applications.