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New high sensitive pigment-dispersed color photoresists for LCD color filter have been developed. High density of cross-linking with low exposure energy was achieved by investigating a combination of several types of acrylic monomer and photo-initiator. These photoresists are compatible in high sensitivity and high pigment content, and also have wide process margin with low exposure energy. Furthermore, these photoresists have a good surface flatness and good coating uniformity.

Development of SSQ Based 157nm Photoresist

Akihiro Hayashi , Raymond J. Hung , Mikio Yamachika , Takashi Chiba , Haruo Iwasawa , Noboru Yamahara , Tsutomu Shimokawa

Siloxane/silsesquioxane (SSQ) and fluorocarbon materials have been identified to be relatively transparent at 157nm. While the main stream of material research effort has been focused on the synthesis of fluorocarbon polymers, we have made significant progress on developing silsesquioxane polymers for 157nm photoresist application. Our current SSQ based photoresists ( , , and type shown in this paper) have absorbance value ranging from 3.4 to 2.5-1 , With a 1200 thickness, type has demonstrated 60nm L/S using a 0.85 NA F2 Exitech tool with an alt-PSM and and type have demonstrated 75nm L/S using a 0.60NA tool. type resist patterns (L/S) have been successfully transferred down to underlying spin-on carbon hard mask (HM) using N2/O2 RIE. Progress also has been made on reducing the absorbance of SSQ polymers. A new type SSQ polymer showed absorbance value of 1.66-1. The design concept and physical properties of synthesized SSQ polymers are presented. Lithographic performance of SSQ based resists is also discussed.

Photolithographic Properties of Photosensitive Sol-Gel Materials and Their Application to Optical Waveguides

Kentarou Tamaki , Tomohiro Utaka , Hideaki Takase , Yuuichi Eriyama , Takashi Ukachi

Novel photosensitive sol-gel materials, which are comprised of siloxane oligomers and a photo acid generator (PAG), have been developed. The spectroscopic studies led to the observation that sol-gel reaction was affected by a balance of between PAG and amine content added as catalysts. Additionally, the balance strongly influenced the line pattern profile formed with exposure, which indicated that the photolithographic properties changed from negative to positive tone with the amine content. An optical channel waveguide based on sol-gel materials was fabricated through photolithographic processing and showed low propagation losses that were 0.3dB/cm and 0.6dB/cm at 1.31 and 1.55, respectively, in addition to excellent long-term reliability.

Compatibility and Properties in the Blends of Polypropylene with Hydrogenated Polystyrene-block-polybutadiene-block-polystyrene (SEBS), and Application for Compatibilizer

Nobuyuki Toyoda , Kazuhisa Kodama , Yukiko Nishimura , Masashi Shimakage , Motokazu Takeuchi , Iwakazu Hattori

Compatibility of a series of hydrogenated polystyrene-block-polybutadiene-block-polystyrene (SEBS) with isotactic polypropylene (PP), and properties and morphology of the blends were investigated using tensile test, transmission electron microscope (TEM), dynamic mechanical analysis (DMA), differential scanning calorimetry (DSC) and pulse NMR. These SEBS copolymers were prepared by hydrogenation of anionically polymerized polystyrene-block-polybutadiene-block-polystyrene (SBS) with the same amounts of polystyrene and polybutadiene blocks. Only content of 1, 2-structure (vinyl content) in polybutadiene block was varied from 41 to 85% in order to examine effects of vinyl content. TEM images showed that the morphology of those blends, PP/SEBS=70/30, varied with vinyl content of SEBS, which indicated that compatibility of SEBS with PP increased with increase in vinyl content of SEBS. This higher compatibility of SEBS with high vinyl content improved the mechanical properties and transparency of the blends. The novel-developed high vinyl content SEBS compatibilized the polystyrene/PP blend and improved the balance between impact strength and elongation in the blend.

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