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We study the phase-separated structures of thin polymer blend films using dynamic density functional simulations. Thin film is sandwiched between free surface and substrate wall, and we realize these effects in our simulations to include the void phase with the wall potential. We can obtain the simulation results of the layered structure near the free surface, that near the wall, and the bulk-like phase-separated structure inside the film. These structures have already been seen at the early time steps of our simulations. As the time evolves, the domain growth occurs, and at the free surface we can observe the transient roughening structures. We assume that the surface roughening is due to the formation of droplets on the polymer phase. In this simple model of the droplets, we consider the balance of the interfacial tensions among the two kinds of polymer phases and the void phase, and we can obtain the condition for the surface roughening. The simulations using the set of parameters derived from the roughening conditions can successfully reproduce the theoretically predicted structures.

Pulsed Laser-Induced Liquid Crystal Alignment Parallel to the Exposure Polarization

Yinghan Wang , Toru Natsui , Yutaka Makita , Atsushi Kumano , Yasumasa Takeuchi

The alignment of a nematic liquid crystal (LC) parallel to the polarization direction of the laser could be induced by three types of polyimide (PI) films, a PI based on aromatic dianhydride and two PIs on alicyclic dianhydride, exposed to polarized pulsed laser at 266 nm at high fluence in air. The UV-visible absorption spectra of the PI films showed that a remarkable chemical change occurred after exposure at the high fluence in air. In contrast, in argon atmosphere the PI based on aromatic dianhydride was radiation-resistant and the exposed PI film could induce alignment of the LC molecules parallel to laser polarization. We estimate that the mechanism of the parallel alignment observed in argon is not the photodegradation but the orientation of the PI molecules.

Design and lithographic performances of 193-specific photoacid generators

Hiroyuki Ishii , Shinji Usui , Katsuji Douki , Toru Kajita , Hitoshi Chawanya , Tsutomu Shimokawa

The improvement of the transparency of photoacid generators (PAGs) has a researchers' attention for 193-resist application. In this study, sulfonium salt was chosen as a target PAG. Triphenyl sulfonium salt (TPS) showing strong absorption at 193 nm was selected as a standard PAG. Starting from the ordinary compound, designing several 193-specific PAGs was attempted. Molecular orbital (MO) calculation was used for the estimation of transparency of PAGs. The calculated absorption results fit in with observed absorption spectra of synthesized PAGs in poly(methyl methacrylate) matrix. Furthermore, MO calculation illustrated that polycyclic aromatic systems based on -system extension concept should be preferable in terms of transparency at 193 nm. A new PAG was synthesized based on the -extended concept. The resist comprising the new PAG was evaluated in order to verify the effect of transparency improvement. The resist provide good lithographic performances, vertical wall angle without deterioration of photospeed. The MO calculations have materialized a 193-specific PAG for further improvement of resist performances.

Development and Commercialization of Hydrogenated Ring-opening Metathesis Polymers

Toshihiro Ohtsuki , Kohei Goto , Zen Komiya

New hydrogenated ring-opening metathesis polymers have been developed and commercialized. These polymers are prepared by ring-opening metathesis polymerization of ester substituted tetracyclododecene monomers followed by hydrogenation of main chain double bond. It was necessary to be hydrogenated as completely as possible to obtain a thermally stable polymer. This polymer is heat-resistant transparent resin with excellent optical properties, and is alternative to glass or other transparent polymers such as polymethylmethacrylate and polycarbonate.

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