| JSR TECHNICAL REVIEW No.106 (March, 1999) |
| |
| The Comparison between Silica and Carbon Black Loaded Compounds as a Tire Tread in terms of Time-Temperature Superposition of Loss Tangent |
 Shear
storage modulus (G') and loss tangent (tanδ) were measured
carefully at low strain amplitude over a wide range of
frequency and temperature on SBR vulcanizates filled with
carbon black and silica where filler content, oil content,
and microstructure of SBR varied. The data were shifted
along the frequency scale. The data points of the individual
tanδ-frequency curve were found to be able to overlap
with the adjacent curves, resulting in a single composite
master curve for all the samples studied. Same set of
shift factors obtained from tanδ could be used to construct
G' master curves. It was found that all the data of shift
factor, aT, made a single WLF curve irrespective of the
differences in filler, loading content of filler/oil,
and microstructure of SBR, if the reference temperatures
are chosen at the respective temperature where tanδ of
the individual sample showed peak value. The results may
suggest the laboratory indices customarily used for rolling
resistance and wet skid resistance of a carbon black filled
SBR vulcanizate could be applicable to those of silica
filled one. |
|
| |
| A Study on Influence of Base Paper to Blistering Resistance of Coated Paper with Acceleration of Air Permeability |
| We
reported that we developed a new air permeability tester
with which we could measure the acceleration of the air
permeability (AAP) of coated paper under high temperatures
and high pressures during a short time. And we found that
AAP was more strongly related to the blistering tendency
of coated paper, before. In this paper, we used various
base papers, and studied the influence of base paper to
blistering resistance of coated paper with AAP. Then we
found that a new factor, the slope which was obtained
through AAP and coating weight (less than 5 g/m2 on side)
plot, was strongly related to the blistering tendency.
So, the result indicates that the interface property between
base paper and coating layer has an influence upon the
blistering resistance. |
|
| |
| Design of i-Line Photoresist Capable of Sub-Quarter Micron Lithography: Effects of Novel Phenolic Resin with Controlled End Group |
| A
new type of polymerization system for phenolic resin is
proposed for high performance positive-working i-line
photoresists used for sub-quarter micron lithography.
A new design of phenolic resin is also proposed. The effects
of end group of phenolic resin are mainly discussed from
the standpoint of the dissolution characteristics of the
photoresist and their lithographic performances; the resolution
of 0.20μm (1L/1.5S) on BARC with an annular illumination
aperture (NA = 0.57, 2/3σ=0.70). |
|
| |
| Development of New Polyimides for Photo-Alignment of Liquid Crystal |
| We
designed poIyimide films for liquid crystal (LC) alignment
using a polarized UV exposure. Unidirectional LC alignment
with any desired pretilt angles from 0 up to 90* were
obtained using a single oblique polarized UV exposure.
Results suggest that the selective photo-decomposition
of the polyimide produces anisotropic van der WaaIs forces
which align the LC. |
|
| |
| New Photo-Aligned Multi-Domain Liquid Crystal Display Formed by Utilizing a Liquid Crystal Polarizer |
| We
developed a new photo-aligned multi-domain liquid crystal
display formed by utilizing a liquid crystal polarizer
(LCP). The LCP was fabricated using double UV exposure
and special liquid crystal materials. Any desired multi-domain
liquid crystal configuration can be fabricated with a
single UV exposure through the LCP. The resulting multi-domain
liquid crystal cell made by use of the LCP showed high
resolution with the identical pattern of the LCP and with
a high dichroic ratio, comparable to liquid crystal cells
made by rubbing. |
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