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Message | Organization | Laboratories | Awards | Latest Research Reports HOME > R&D > Latest Research Reports JSR TECHNICAL REVIEW No.116 (March, 2009) -Development of Aromatic Polymer Electrolyte Membrane with High Conductivity and Durability for Fuel Cell- -Aggregation Behavior of New Cyclic Saturated Copolymers Synthesized via Ring-opening Methathesis Polymerization- -Characteristics of a Structural Color of Hollow Particles- -Double Patterning Materials for Sub-40nm Application-     JSR TECHNICAL REVIEW No.115 (March, 2008) -Properties of Hydrogenated Polystyrene-blockpoly ( styrene-co-butadiene) -block-polystyrene(SSEBS)and its Miscibility in the Blends with Polypropylene- -Advanced CMP Consumables for 32nm Generation- -High Reliability Alignment Material for Active Matrix LCD Fabricated by Low Temperature Bake Processes- -Development of Magnetic Particles for Biomolecule Separation-     JSR TECHNICAL REVIEW No.114 (March, 2007) -Modified Solution SBR for the Next Generation- -Performance Comparison of Chemically Amplified Resists under EUV, EB and KrF Exposure- -Solution-Processed Silicon Films and Transistors- -The Effect of the Fiber Temperature During Fiber Drawing on the Properties of Primary Coatings-     JSR TECHNICAL REVIEW No.113 (March, 2006) -Development of Novel High-refractive-index Fluid for the Next Generation ArF Immersion Lithography- -Photosensitive Column Spacer Materials for Liquid Crystal Display Panels- -Toughness Improvement of Epoxy Resins for Photofabrication- -Influence of Diffused Light on Visual Perception of Print Gloss in Coated Paper-     JSR TECHNICAL REVIEW No.112 (March, 2005) -Advanced CMP Consumables with Low Defectivity- -Quantitative Evaluation of Scratch Resistance of Organic-Inorganic Hybrid Hard Coatings- -Analysis of Surface and Interface of Polymer Films by NEXAFS- -Structure and Mechanical Properties of Olefinic Thermoplastic Vulcanizates-     JSR TECHNICAL REVIEW No.111 (March, 2004) -Spin-on-glass (SOG) for Tri-layer Imaging Process- -Single-mode Optical Fiber Interconnection by using Self-Written Waveguides- -A General Method to Induce Durable Liquid-Crystal Pretilt Angle on Photo-Alignment Films- -Application of a New Evaluation Method of Sheet Appearance to Various Coated Papers-     JSR TECHNICAL REVIEW No.110 (March, 2003) -High Sensitive Pigment-Dispersed Color Resist for LCD Color Filter- -Development of SSQ Based 157nm Photoresist- -Photolithographic Properties of Photosensitive Sol-Gel Materials and Their Application to Optical Waveguides- -Compatibility and Properties in the Blends of Polypropylene with Hydrogenated Polystyrene-block-polybutadiene-block-polystyrene(SEBS), and Application for Compatibilizer-     JSR TECHNICAL REVIEW No.109 (March, 2002) -Soluble Mainchain Polyoxadiazoles as Electron Transport Materials- -Effect of Film Thickness on Electrical Properties of Polyimide Thin Films- -193 SLR System based on COMA-Acryl hybrid system- -Inorganic Compounds as Coatings on Polymer Particles and as Hollow Spheres-     JSR TECHNICAL REVIEW No.108 (March, 2001) -Dynamic density functional study of the phase separated structures of thin polymer blend film- -Pulsed Laser-Induced Liquid Crystal Alignment Parallel to the Exposure Polarization- -Design and lithographic performances of 193-specific photoacid generators- -Development and Commercialization of Hydrogenated Ring-opening Metathesis Polymers-     JSR TECHNICAL REVIEW No.107 (March, 2000) -Development of Photo Alignment Materials with High Sensitivity to Near UV Light.- -Development of ArF Single Layer Resist Materials Using Tetracyclododecene.- -Preparation of Micron-Size Polystyrene Particles in Supercritical Carbon Dioxide.- -Di Functional Solution SBR for Low Hysteresis Compound.- -Photosensitization of Carbazole Derivatives in Cationic Polymerization with Novel Sensitivity to Near UV Light.-     JSR TECHNICAL REVIEW No.106 (March, 1999) -The Comparison between Silica and Carbon Black Loaded Compounds as a Tire Tread in terms of Time-Temperature Superposition of Loss Tangent .- -A Study on Influence of Base Paper to Blistering Resistance of Coated Paper with Acceleration of Air Permeability .- -Design of i-Line Photoresist Capable of Sub-Quarter Micron Lithography: Effects of Novel Phenolic Resin with Controlled End Group .- -Development of New Polyimides for Photo-Alignment of Liquid Crystal .- -New Photo-Aligned Multi-Domain Liquid Crystal Display Formed by Utilizing a Liquid Crystal Polarizer .-     JSR TECHNICAL REVIEW No.105 (May, 1998) -Development and Industrialization of Transparent Heat-Resistant Resin, "ARTON".- -Development of Optical Fiber Ribbon Materials with Novel Surface Character.- -Study on Adhesion Properties of Optical Fiber Coatings.- -Novel UV Curable Resin Based on Oxetane for Photofabrication.- -High Brightness and High Transparency Color Resist.- -Polymerization of Butadiene with Novel tert-amino Group Initiator.- -Properties of Polypropylene / Hydrogenated Styrene-Butadiene Rubber Blends.-     JSR TECHNICAL REVIEW No.104 (March, 1997) -Toughening of Epoxy Resins by Modification with Crosslinked Rubber.- -A Study on Blistering Resistance of Coated Paper with a New Air Permeability Tester.- -PED Stabilized Chemically Amplified Photoresist.- -Color Resists for Color Filters.-