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Semiconductors

PhotoresistsCatalogue(PDF 673KB) / Catalogue(PDF 1101KB)

JSR's full product line for imaging super critical features includes 248 and 193nm positive and negative tone photoresists, and g-line and i-line resists for critical and non-critical applications. JSR also provides a full array of related materials, including spin-on hardmask materials for advanced technologies.

Top Coat Materials for Immersion Lithography

This material prevents liquids such as water used in immersion lithography from penetrating into the photoresists, and at the same time can play a role in preventing a sublime substance produced by photoresist materials from exerting a damaging influence on the high quality lens surface of the exposure tool.

Multilayer Hardmask MaterialsCatalogue(PDF 921KB)

JSR develops organic and inorganic spin-on hardmask materials by utilizing its proprietary technologies.

Next Generation Lithography MaterialsCatalogue(PDF 1016KB)

JSR develops various lithography materials such as EUV photoresists for next generation semiconductor manufacturing process for 10nm node and beyond.

CMP SlurryCatalogue(PDF 580KB)

This is a CMP slurry (Chemical Mechanical Planarization) necessary for the production of high performance LSI manufacturing.

Post CMP Cleaning SolutionCatalogue(PDF 604KB)

This cleaning solution is used to remove impurities such as metals, organic and slurry residues from planarized wafer surface.

Lift-off Processing Photoresists LUMILON® LP SeriesCatalogue(PDF 664KB)

This product can provide an ideal under-cut profile which is suitable for the foaming of electrode/wiring in the LED element manufacturing and so on as "Lift-off" photoresist.

Thick-film Processing Photoresists ELPAC™ THB SeriesCatalogue(PDF 901KB)

This product can be used in the forming of wiring on a variety of circuit boards, micro bumps, flip chip bumps and boasts of excellent resolution, resistance to all kinds of plating liquid, and durability in the vacuum process. You can achieve a 80μm nega-resist with just one spin coat.

Photosensitive Insulating Materials ELPAC™ WPR SeriesCatalogue(PDF 664KB)

WPR series are used as spin-on photo sensitive insulation materials for re-distribution line layers and over coat layers for WL-CSP (Wafer Level Chip Scale Package) or SiP (System in Package) and for organic passivation layers for semiconductor devices.

Materials for 3D IntegrationCatalogue(PDF 581KB)

JSR provides temporary bonding materials and photosensitive adhesive.

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Displays

Liquid Crystal Alignment Films OPTMER AL Series

AL series (alignment coating materials) are used in manufacture of LCD. Both polyimide type (pre-imidized organic-solvent-soluble type) and polyamic acid type are available.

Heat-curable Protective Coating Materials OPTMER SS Series

SS series (heat-curable protective coating materials) are used for overcoatings of color filters. They are mainly composed of acrylic polymers. Both one-liquid type and two-liquid type are available. Two-liquid type is mixed just before using.

Heat resistant, Transparent, Photosensitive Protective Film OPTMER PC/NN Series

NN series (negative-tone photo resists composed of acrylic polymers) are mainly used as overcoating materials for COG (chip on glass)-type color filters, and also used for spacer formation of touch panels and LCD panels.
PC series are newly developed positive-tone photo resists, which are mainly composed of acrylic polymers.They are favorable for interlayer films of TFT arrays for high aperture design.

Pigment Dispersed Resist OPTMER CR Series

CR series (pigment dispersed negative-tone photo resists) are used to form color filter layers for LCD. Red, Green, Blue, and Black colors are available.

OLED Materials OPTOMER™ JEM SeriesCatalogue(PDF 412KB)

JSR will further develop and expand our product portfolio for OLED materials, such as pixel defining layer, planarization layer, encapsulation, and low temperature curable color resist etc.

Low Temperature Curable Alignment Material OPTOMER™ LD SeriesCatalogue(PDF 428KB)

JSR is providing alignment materials for flexible/film substrates which can be cured by low temperature. For example, resin films such as TAC can be used as substrate with optical anisotropy added.

ARTON Resins

ARTON is a transparent resin (ring-forming olefin resin) which has superior optical properties, dimensional stability and furthermore, revolutionary heat resistance.
ARTON is a high functional resin suitable for optical applications such as optical films, light guide panels and optical lenses.

ARTON Films

ARTON FILM is an optical film that offers superior optical properties, dimensional stability and heat resistance. ARTON FILM is a film manufactured in a clean environment and has a high quality appearance, making it suitable for use in optical applications such as LCD retardation films and touch panels.

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Optical Lens

ARTON Resins

ARTON is a transparent resin (ring-forming olefin resin) which has superior optical properties, dimensional stability and furthermore, revolutionary heat resistance.
ARTON is a high functional resin suitable for optical applications such as optical films, light guide panels and optical lenses.


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Optical Fibers

Optical Functional Materials DESOLITE

Optical fiber communication networks are the infrastructure of the communication society. JSR is a strong contributor to the development of this network. JSR has produced DESOLITE, an optical fiber coating which is curable in a short time with UV light. DESOLITE is used for coating each of the elemental optical fibers one by one.


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