JSR Corporation will participate in the "SEMICON Japan 2006" held for three days from December 6, through December 8, 2006 at Makuhari Messe (Japan Convention Center, Inc.) in Chiba Prefecture, Japan. Also, its annual private seminar "JSR SEMINAR JAPAN 2006" will be held on Friday, December 8th at Hotel New Otani Makuhari, located next to the exhibition hall.
JSR remains committed to working closely with our customers to find innovative materials solutions to their unique processes. JSR highlights its complete range of innovative materials mentioned below.
Products exhibited:
+Advanced ArF Photoresists
+ArF Immersion Photoresists
+Immersion Lithography Materials
+KrF Photoresists "JSR KRF Series"
+Spin-on Hardmask Materials
+CMP Slurries "JSR CMS Series"
+CMP Pads
+Interconnect Materials "LKD Series"
+Thick Layer Photoresists "JSR THB Series"
+Photo Sensitive Dielectric Materials "JSR WPR Series"
+Size Standard Particles "STADEX" / "DYNOSPHERES" / "CLINTEX"
+Constant Number Aerosol Generator "AEROMASTER- V"
+WLT-PCR(Wafer Level Testing PCR)
+Pressure Sensitive Conductive Rubber / Socket for CSP Testing
+PCR for Substrates Contact
+Socket for ROM Writer |
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