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Corporate Profile

History


Foundational Period (1957 - 1973)

1957 
12Company founded(as Japan Synthetic Rubber Co., Ltd.)in accordance with the Special Measures Law for the Synthetic Rubber Manufacturing industry.
1960 
4Yokkaichi Plant began production and sales of butadiene,SBR,and SB latex lines.Osaka Branch was Opened.
1962 
6The Nagoya Branch was opened. Sales of High-styrene latex began.
1963 
7Sales of High-styrene rubber began.
1964 
5After the 8th annual settlement of accounts, dividends to shareholders began.
10JSR advanced into the field of synthetic resins and production of ABS resin began within the Yokkaichi Plant.
11Sales of NBR began.
1965 
2Sales of BR began.
1966 
10CTPB (an adhesive for solid rocket fuel) was developed.
1967 
5Sales of ROADEX (asphalt pavement reinforcement) began.
1968 
4The Chiba Plant was completed, and production of butadiene began.
7The European Office was opened.
1969 
3Sales of IR began.
4Changed company's status to private owned.
1970 
9Sales of EPDM began.
1971 
1The Kashima Plant was completed, and production of butadiene and SBR began.
8Stocks were listed on the First Section of both the Tokyo and Osaka Stock Exchanges.
1972 
12Sales of IR began.

President Ishibashi at the Opening Ceremony of the Yokkaichi Plant

Groundbreaking Ceremony of the Chiba Plant

President Kawasaki at the Opening Ceremony of the Kashima Plant

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Pursuing Diversification (1974 - 1990)

1974 
6Sales of RB began.
1975 
4Production and sales of PCR (Pressure-sensitive Conductive Rubber) began.
1978 
2Sales of asphalt and spray emulsions began.
9Sales of asphalt and spray emulsions began.
1979 
4Sales of CIR (negative type photoresist) began. JSR advanced into the electronic materials business.
1981 
4Sales of AES resin began.
7With the commencement of sales in IMMUTEX (uniform latex for clinical dianosis), JSR advanced into the medical field.
1982 
5Importation and sales of optical fiber coating materials began.
11Sales of PFR (positive type photoresist) and AFLAS (fluorocarbon elastomer) began.
1984 
5Sales of DESOLITE (optical fiber coating materials), SBS (thermoplastic elastomer) , resin began. Mighty Series (structural adhesive) began.
1985 
5Sales of SIS (Styrene Isoprene block Copolymer) began.
1986 
3Nylon 46 was marketed.
9Sales of JENIX (EPDM / Silicone rubber blend) began.
12Sales of STADEX (size standard particles) began.
1988 
3Sales of OPTMER AL (Alignment films for LCDs) and OPTMER SS (protective coatings for LCDs) began.
1989 
4Two-day weekends and flexible working hours were introduced to the entire company. Under cooperative development with Sony Corp., the Solid Creation System, which makes 3D plastic models by using lasers and computers was developed, and sales began.
5Tsukuba Research Laboratory was officially opened.
10Japan's first plant specializing in TR(thermoplastic elastomer) production, SHELL JSR ELASTOMERS K.K.was completed within the Kashima Plant.
11Sales began on newly developed PCRs and ICs inspection systems.
1990 
2Concerning photoresists for Europe and North America, a joint venture contract was signed with UCB S.A. (Belgium).
3The senior employment system was introduced.
4A program initiating Equal Opportunity for female employees was introduced.The creative holiday system was introduced. ARTON (heat resistant transparent resins) was developed.
6The production method of crosslinked hollow particles was established, and the development of new markets was undertaken.

Optical Fiber Coating Materials

Tsukuba Lab.

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Consolidating Diversification (1991 - 2001)

1991 
5CDs made from ARTON which create the realism of a live performance were developed.
7STADEX having a diameter of 0.1um received certification from NIST.
10Sales of DYNAFLOW and DYNACLIN (water soluble polymer) began.
1992 
1Childcare leave and healthcare leave systems were introduced.
5DYNARON (hydrogenated polymer) and DYNARON ALLOY (the thermoplastic elastomer using this polymer) were developed, and sales began.
1993 
1Childcare leave and healthcare leave systems were introduced.
4Sales of NANOMASTER (high concentration microsol generator) and FILTEX (standard particle dispersion liquid) began.
5Sales of Printed Circuit Board Testing Fixtures employing new type PCR began.
7UCB-JSR Electronics S.A. (Belgium) became wholly-owned subsidiary of JSR, and restarted by being renamed JSR ELECTRONICS N.V. Simultaneously JSR MICROELECTRONICS,INC. acquired U.S. operation as their subsidiary.
1994 
2ISO9002 certification were obtained for synthetic resin and NBR of the Yokkaichi Plant.
4Companywide PLP (Product Liability Prevention) system was established.
12The Shanghai Office was opened. Sales of OPTMER CR (color pigment dispersed resists for LCDs color filters) began. In order to conduct local production of CMB, capital investment was made in PI INDUSTRY LTD.(Thailand).
1995 
7The Seoul Office was opened.
8Commissioned Production Agreement of ABS resin was concluded with a resin manufacturer, GPCT (Thailand).
9ISO9002 certification was obtained for the opto-electronic materials of the Yokkaichi Plant.
11A high transfer blow molding technology (J-Blow) which gives excellent appearances equivalent to injection molding was developed.
1996 
2To establish a synthetic rubber producing company, BST Elastomers Co., Ltd. (Thailand) a joint venture business agreement was executed among BST Co., Ltd., Nippon Zeon Co., Ltd., JSR, etc.
6A microphotoresist manufacturing subsidiary, JSR Electronics Kyushu Co., Ltd.(Saga) was established. Sales of epoxy type photo-curing resin having high accuracy, high-performance for photofabrication (stereolithography) models.In Tianjin (China) a joint venture company, TIANJIN KUO CHENG JSR RUBBER INDUSTRY Co., Ltd. was established together with KUO CHENG INDUSTRIAL Co., Ltd. (Taiwan).
7The ABS resin business was integrated with that of the Mitsubishi Chemical Corp., and a joint venture company, Techno Polymer Co., Ltd. was established.
1997 
2JSR・DSM Engineering Plastics Co., Ltd. a joint venture company between DSM Engineering Plastics B.V.(Holland) and JSR was established.
3Construction work was completed for photoresist plant of JSR MICROELECTRONICS, INC.
4Free Time System was introduced into the Research and Development Dept. New Mid-Term Plan “JSR 21”started (from fiscal year '97 to fiscal year 2001).
10The Taiwan Office was opened. Completed a photoresist production plant of JSR Electronics Kyushu Co., Ltd.
11The Singapore Office was opened. ARTON Process Research Laboratory was officially opened.
12Changed of corporate name to "JSR Corporation."
1998 
3ISO14001 certification was obtained for the Yokkaichi Plant.
4ABS and AS resin plants at the Yokkaichi plant were transferred to Techno Polymar Co., Ltd.
7The exhaust gas boiler facility was installed in ABS resin plant at the Yokkaichi plant to deodolize its exhaust gas.
8Completion of the BST Elastomaers synthetic rubber factory in Thailand. (annual production capacity of 60,000 tons of SBR and 40.000 tons of BR)
9World -first development of oxycetane resin for photo fabricating models, whichi achieve greater toughness and precision.
1999 
1"Corporate Ethical Principles" and "Ethical Corporate Behavior" adopted to law-abiding and highly transparent management.
2Photosensitive spacers and other LCD Materials launched in a new high-performance product range to create LCD panels of higher contrast and precision.
4

A new mainstay information system was constructed and put into full information from April 1 st to unify the management of informantion on sales, operation, accounts, personnel and all other aspects of business astivity.

High-performance ;olishing slurries (the CMS series) launched for full-scale sales.

JSR Microelectronics (US) became the first japanese-affiliated resistar manufacturer to begin production of excimer laser photoresist outside Japan.

ISO14001 certification was obtained for the Chiba Plant.

5ISO14001 certification was obtained for the Kashima Plant.
11

JSRR developed organic/inorganic hybrid hardcoating material which hardens under ultra violet light.

JSR actively began to market anti-reflection film coating material.

12

JSR developed JSR LKD, a low dielectric interlayer material for large scale integration (LSI) devices.

2000 
2JSR to commercialize IBM semiconductor imaging technology, Enhanced Integrated Photoresist imaging System.
3New masterbatch company established in Thailand.
4IMEC (Inter-unibersity Micro Electronics Center) selected JSR ArF resist for 130nm devices.
12International SEMATECH demonstrates a dual damascene copper interconnect structure using JSR LKD.
2001 
3New plant start to produce coating materials, Desolite, for optical fiber. JSR realize Dual Production Sites.
6President Matsumoto became Chairman, and Vice president Yoshida became the new president.
9Commenced construction of the new production facilities for semiconductor materials in Belgium. (Commercial production will begin in early 2003.) Tri-polar production and supply system has been strengthened.
10Launch of "JSR EXCELINK," new sophisticated olefin-based thermoplastic elastomer.
11Commercialization of polishing pads for CMP for production of semiconductors was determined. Commenced construction of new production facilities in the Yokkaichi plant. (Commercial production will begin in September 2002.)
12Mass production for dry film materials for PDP(plasma display panel)began.

ARTONR Compact Disks

JSR Micro Kyushu Co., Ltd.

JSR Microelectronics,Inc.

Corporate Logo of JSR Corp.

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Business Portfolio Innovation (2002-2010)

2002 
3Production of emulsion polymerization SBR is consigned by Sumitomo Chemical Co., Ltd. for improvement in productivity.(Consigned production will begin in October 2002 in the Yokkaichi Plant.)
4JSRevolution," a new mid-term plan (FY2002-2004) began.
6International SEMATECH Provides JSR LKD-5190 Low-k Dielectric with Test Wafer Distribution.
10JSR Electronics Kyushu Co., Ltd., JSR Microelectronics, Inc. and JSR ELECTRONICS N.V. changed their names to "JSR Micro Kyushu Co., Ltd.," "JSR Micro,Inc." and "JSR Micro N.V." accordingly. Begins production of emulsion polymerization SBR consigned by Sumitomo Chemical Co., Ltd. Posts personnel dedicated to the electronic materials business in the Shanghai representative office to strengthen this business area in China.
11Completes new plant facilities for semiconductor materials in Belgium.
12Completes new plant facilities for CMP polishing pads in the Yokkaichi Plant.
Concludes agreement with Honeywell of the U.S. for global sales of Honeywell's bottom anti-reflective coating for semiconductor manufacture.
2003 
5Relocates the Head Office to HAMARIKYU Parkside Place, 6-10 Tsukiji5-chome, Chuo-ku, Tokyo, Japan.
6CSR study committee established aim to execute the Corporate Social Responsibility and the compliance.
Consignment production of S-SBR by Dow Europe GmbH started.
12Production plant of ARTON film for optical use was completed on the Yokkaichi Plant premise.
2004 
1Received TSE "9th Financial Disclosure Award".
Stock trading unit reduced from 1,000 to 100 shares.
2Established capacity to produce 3,000tons per annum of ARTON high performance heat-resistant transparent resin.
4The "JSRevolution" midterm plan was achieved within two years (one year earlier than scheduled) and the new midterm plan "JSRevolutionII" ('04 to '06) has been launched.
JSR group company "NICHIGO SHOJI CO.,LTD." changed name to "JSR Trading Co., Ltd.".
5Constructed JSR Micro,Inc.,the application laboratory of CMP for semiconductor manufacture.
6Achieved "zero waste" at all plants as a first for the petrochemical industry.
7JSR group company "Nichigo Engineering Co., Ltd." changed name to "JSR ENGINEERING CO., LTD.".
10JSR Micro Korea Co., Ltd (plant for production of LCD Materials) was completed and started commercial production.
12Succeeded as the first company in the world to achieve a resolution of 32 nm through ArF Immersion Lithography.
2005 
4Began broadcast of a TV commercial on "Molecular Technology".
JSR has developed photocatalytic coating materials with super long-term durability making use of organic/inorganic hybrid technology, and has launched it as a new product in the DYNACERA lineup.
8Completed the 2nd phase construction of the production plant for display materials (JSR Micro Korea Co., Ltd) in South Korea, and full operations began.
11Increased production capacity for S-SBR (Solution Polymerized SBR).
2006 
1Completed the construction of new clean room facilities at the Yokkaichi research center.
Succeeded the development of Electrolyte Membrane for fuel cells.
2Together with IBM, JSR has further advanced the viability of immersion lithography by demonstrating sub-30nm patterning with ArF lithography systems.
3Acquired the Display Coating Business from DSM Desotech Inc.
Completed construction of precision machining pilot facilities at the Yokkaichi plant.
4Succeeded in development of high quality silicon film through micro liquid processes together with Seiko Epson Corporation.
10Received the Best Supplier Award for ArF resist for the next generation memory from Samsung Electronics.
11Start the project to establish Internal Control System.
The 2nd phase construction of JSR Micro Taiwan starts.
12Completion of a fine Production Line of Lithography Materials "ME line" for Next Generation semiconductor devices.
2007 
3Completes Yokkaichi Training center
Launched the Campaign of the Corporate Slogan,"With chemistry,we can."
Received Japan Industrial Techniques Grand Prix.
Completes "Kinki University Molecular Engineering Institute,JSR Functional Material Research Center."
5JSR received "FY2006 The Society of Polymer Science, Japan Prize" for developing fuel cell electrolyte membrane film.
6Concluded capacity rights agreement with Dow Europe GmbH to receive S-SBR (Solution SBR)
7Established "JM Energy Corporation" for lithium ion capacitor businesses.
11Completed phase II of the constructions of JSR Micro Taiwan Co., Ltd
12Completes of the Precision Process Research Laboratories in the Yokkaichi district.
JSR and IBM concluded a joint-development agreement to R&D next generation semiconductor processes.
Develop synthetic high polymer blocking agent for bioengineering R&D.
2008 
3Develop "Freezing materials" as new semiconductor lithography materials.
Introduce the "Career Redevelopment System" to re-employ former employees who left the company such as to raise children, nurse family members.
5JM Energy Corporation becomes the 100% subsidiary.
9Singapore office was opened.
11JM Energy Completed construction of world's first commercial production plant of lithium ion capacitors.
2009 
1Relocates the Head office to Shiodome Sumitomo Bldg., 1-9-2 Higashi- Shimbashi, Minato-ku, Tokyo.
2Completed facilities for commercial-scale production of electrolyte membrane for fuel cells.
3Received the "14th Disclosure Award" from Tokyo Stock Exchange.
4President Yoshida is promoted to Chairman and Executive Managing Director Koshiba promoted to President.
5Increasing Production Capacity of Butyl Rubber at Japan Butyl's Kawasaki Plant
6JSR introduces self-freezing ArF Photoresist for double patterning process
11JSR Starts Operations at New Plant Facilities for Cutting-edge Lithography Materials in Response to Increase in Demand for ArF Photoresists
2010 
1JSR awarded CSJ's 58th Award for Technical Development 2009
3JSR to establish overseas subsidiary in China
JSR and Kinki University expand their Research Center of Advanced Materials
Developed "LUMILONR," LED-related Performance materials.
4Installation of a large-scale, natural gas-fired turbine cogeneration system at the Yokkaichi Plant.
7Announcement of Increasing production capacity of S-SBR (solution polymerization styrene-butadiene rubber) and DYNARON (hydrogenated polymer)
9Establishment of a Research Association of Advanced Lithium Ion Capacitor (LIC) Technology
To announce enhancing R&D of LCD Materials in Korea by construction of new research Lab. at JSR Micro Korea
10D-MEC launched DESOLITE SCRTM780, a stereolithography resin with excellent mechanical properties and high transparency.
Entering into optical ITO film market (for touch panels) with in-house technologies "With chemistry, we can.", the history book of JSR’s first 50 years, was awarded by Japan Business History Institute.
Japan Butyl Co. Ltd. completes Butyl
Launching new, highly tough Polylactic acid-based bioplastic:"BIOLLOYTM"
11E-TEC urethane adhesive to be used in high-end sports car

JSR Micro NV (Belgium)

JSR Micro Korea Co., Ltd.

TV Commercials

New Cleanroom Facility at the Yokkaichi

Precision Processing Pilot Facilities at the Yokkaichi Plant

Yokkaichi Training Center

TV Commercial Message; "SAKURA" growing in a barren wasteland

Precision Processing Pilot Facilities at the Yokkaichi Plant

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Activation Toward Growth (2011 - 2013)

2011 
1Announcement of expansion of EPDM production capacity at JSR Group
JM Energy Corporation has been taken up as a Project for Encouraging the Siting of Low-carbon-emission Employment Creating Business Operations, sponsored by the Ministry of Economy, Trade and Industry.
Enhancing R&D for LCD Materials in Taiwan by construction of New Research Lab at JSR Micro Taiwan
2JM Energy succeeds in reducing resistance of ULTIMO lithium ion capacitors
JM Energy developed the world's first flat prismatic type lithium ion capacitors and associated control module
3Announcement of establishing a joint venture and construct a plant for S-SBR in Thailand

Flat prismatic type lithium ion capacitor

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Corporate Profile